self-masking相关论文
Effect of CHF3/Ar Gas Flow Ratio on Self-masking Subwavelength Structures Prepared on Fused Silica S
Based on an advanced technology, randomly-aligned subwavelength structures (SWSs) were obtained by a metal-nanodot-induc......
目前临界路径跟踪算法中确定扇出源临界性时,未同时考虑扇出源的自屏蔽和多路敏化现象,进而导致处理结果出现近似问题,对此研究了......